Airco Temescal FC 3200 Filament. Nanometrics Nanoline||| CD measure MDC CV plotters. 5', 6” & 8” capable systems in the “ST” and “F” models. Unable to fully testInformation: • AIRCO TEMESCAL CV8 POWER SUPPLY (Posted Shipping Quote is Rough Estimate. KF25 Manual Right Angle Valve.
Multiple Thermal Evaporation Source High Vacuum Deposition System. Used thin film deposition system. Physical vapor deposition system. Water cooled bell jar with hoist. Inficon crystal deposition rate monitor.
System has four thermal sources for evaporation of different materials. Source is selected via push button on front panel. System has controls for substrate heaters but none are installed. No substrate fixturing with system but rotation motor and controller are installed.
Automatic valve sequencer. System uses a Varian VHS-6 high speed diffusion pump for high vacuum. Includes vacuum pump. 208V, 3 Ph, 60 Hz. Multisource E-Beam and Thermal Evaporation System for Optical Films and Oxygen Reactive Evaporations. Used thin film deposition system. Inficon IC-4 Plus rate and deposition controller.
Six pocket electron beam source with SR-10 E-Beam power supply. Parts for optical monitor with system but not tested or covered under warranty. Two outrigger style filament resistance sources with 6 kW SCR controlled power supply. Automatic valve sequence controller. Tall water cooled bell jar.
Pressure control system for oxygen reactive evaporations. VHS-10 high speed diffusion pump with roughing pump. Quartz substrate heaters. Slide type fixturing for lift off process.
Does not use substrate rotation type fixturing. High Vacuum E-Beam Evaporation System. Used thin film deposition system.
PVD physical vapor deposition system. Water cooled bell jar. Triple dome planetary fixturing currently configured for 3 in. Inficon IC6000 crystal deposition rate monitor.
Automatic valve sequencer. Four pocket E-gun with manual rotation control. Does not have auto pocket sequencer, manual only. Temescal CV-8 E-Beam power supply with controls. System uses a Varian VHS-6 diffusion pump for high vacuum.
Roughing pump included. FULLY TESTED AND READY TO SHIP! Auto Turbo High Vacuum DC Sputtering System.
Laboratory or light production thin film DC sputtering system with graphic user interface and touch screen control. Manual or automatic operation of valves, pumps, low voltage sources, and fixture rotation subsystems is through this graphical interface. Deposition Chamber: 14 in. D stainless construction. Turbo pump with roughing pump.
(1) Micrometer gas-bleed valve to introduce process gas into the deposition chamber. (1) Gas isolation (toggle) valve for process gas control. Sputter Source: (2) 3.0 in. Dia., Denton Vacuum, internal stalk-mount, planar magnetron sputter sources: I. RF/DC capability, only DC installed. Variable source to substrate distance. Clamp/bond target compatibility.
(2) Independent, electro-pneumatic source shutters (cylinder mounted air flowrate control) interfaced to system PLC for remote open/close operation. Sputter Power Supply: Sorensen DCS Series power supply (1.0 kW, 600 VDC). DC switch to shunt the output of the Sorensen DCS power supply to any of the (2) installed cathodes.Substrate Stage: 6.0 inch omni rotating fixture plate (sputter-down configuration). Speed adjust via input to system touch screen. Multiple Source Resistive Thermal Evaporator with Crystal Deposition Monitor. Continuous uniform coating of irregular surfaces with conductive materials. Simple push button time saving operation using automatic vacuum controller.
Crystal deposition monitor for film thickness control. Compact modern design with all gauges and pumps in a single cabinet. Quartz bell jar with implosion guard. Rotating thermal source selector can accommodate up to four resistive sources. Rotating specimen holder with speed control. Built in diffusion pump with roughing pump.
208V, 1 Ph, 60 Hz, CE. Multiple Source Resistive Thermal Evaporator with Crystal Deposition Monitor. Continuous uniform coating of irregular surfaces with conductive materials.
Simple push button time saving operation using automatic vacuum controller. Crystal deposition monitor for film thickness control. Compact modern design with all gauges and pumps in a single cabinet. Quartz bell jar with implosion guard.
Rotating thermal source selector can accommodate up to four resistive sources. Rotating specimen holder with speed control. Built in diffusion pump with roughing pump.
208V, 1 Ph, 60 Hz, CE. Dual Source Resistive Thermal Evaporation System with Crystal Deposition Monitor. Continuous uniform coating of irregular surfaces with conductive materials.
Turbo pump upgraded high vacuum system. Roughing pump mounted in base. Simple push button time saving operation using automatic vacuum controller. Compact modern design with all gauges and pumps in single cabinet. Crystal deposition monitor for film thickness control.
Two resistive thermal evaporation sources. Quartz chamber with implosion guard. 208V, 1 Ph, 60 Hz, CE. Box Coater EBeam Vacuum Evaporation System.
304 stainless steel water cooled box chamber with Inside Dimensions of 27 in. W x 39-3/4 in. Six pocket E-Gun with Innotec power supply and controls. Planetary style rotating substrate holders currently configured for 4 in.
Squares, see photos on fixturing. Quartz substrate heaters with digital setpoint controller. Air operated and electrically controlled automatic valve sequencing interlocked with system controller. Crystal deposition rate monitor. PC controller. CTI On-Board 8 cryopump with compressor and roughing pump. As Is Untested Price: $39,000.
Fully Tested Price: $79,000. Thin Film Deposition Tool Sputtering and Thermal Evaporation In One Compact Tool. Great laboratory tool with DC sputtering and multisource thermal evaporation in the same tool. Easy to use graphical user interface. Two 3-inch DC magnetron cathodes with variable gap and angle. Three thermal sources.
RF bias substrate plasma cleaning option. Unit has heater controls and feedthroughs but no heater element. Advanced Energy Pinnacle Plus pulsed DC magnetron power supply. Two gas inputs controlled by MFC. Substrate rotation motor. Crystal deposition rate monitor.
Turbo pump and roughing pump. 208V, 60 Hz, 3 Ph. Date of Mfg.: 8-2013. Low Temperature Evaporator Thin Film Deposition System. Low temperature evaporator (LTE) deposits volatile organic materials for thin film formation for organic material based devices.
Crystal film thickness monitor. Quartz substrate heaters for substrate temperature control. 12-inch substrate holder with rotation control. Turbo pumped vacuum system with dry scroll pump roughing. Low temperature source controller with two LTE organic sources.
Touch screen controller on door. Chamber Dimensions: 14 in. Dual Gun E-Beam Evaporator with Ion Gun. E-Beam vacuum deposition system with two E-Guns, one single pocket gun and one four pocket E-Gun. Each E-Gun has an IC6000 crystal deposition rate monitor to monitor the film deposition rate and total. System has a CV-14 E-Gun power supply with separate gun and beam controls for each gun.
Also installed is an Ion Tech Model 3-1500-100 Ion Gun with power supply. System has a CTI-8 cryopump with a compressor but does not come with a roughing pump. Does not have heaters installed but controls are in rack. System is sold As Is but can be refurbished and sold fully tested at an additional cost. Unit was removed from an operational facility but it had been disconnected for some time. E-Beam Evaporator Thin Film Deposition System with 24 in.
Unit just removed from cleanroom, video of operation can be viewed at: This is prior to refurbishment. Price as seen prior to refurbishment $35,000. Temescal BJD-1800 chamber modified with a 24 in. Bell jar to accommodate larger lift off domes. Four pocket E-gun with indexer.
CV-8 power supply with sweep controls. Crystal deposition rate monitor. Cryopump with compressor and roughing pump.
Refurbished Price: $59,000. Multiple Source Thermal Evaporator.
Used thin film deposition system. Proven modular design box coater system can be easily configured for many applications. Currently configured with 3 shutters and 8 water cooled power feed throughs. 3 Inficon XTC crystal deposition monitors each controlled via Khan computer. Substrate carrier for 8 in. Khan process control with user friendly graphics.
Fully integrated multi-tasking PC-based control system, monitors all process data, manages process recipes with built-in failure diagnostics. CTI-400 Cryopump with 9600 Compressor and Pump Package for quick pump down. Very low hours.
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